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Optimization of GaN Barriers During the Growth of InGaN/GaN Quantum Wells at Low Temperature

Published online by Cambridge University Press:  01 February 2011

Kalyan R Kasarla
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
Wenyu Chiang
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
Ronak Rahimi
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
D. Korakakis
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
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Abstract

InGaN/GaN MQWs are grown on c-plane sapphire substrates using a low pressure metal organic vapor phase epitaxy (MOVPE) system. Trimethylgallium (TMGa), Triethylgallium (TEGa), Trimethylindium (TMIn) and ammonia were used as precursors for Ga, In and N, respectively and the growths were carried out at low temperature. Structural properties of grown MQWs are characterized using atomic force microscopy (AFM), and scanning electron microscope (SEM) and x-ray diffraction technique (XRD) is used to calculate the Indium incorporation in these MQWs. Surface morphologies over large areas of InGaN/GaN MQWs are observed using the tapping mode AFM; results indicate the surface roughness depends on the barrier thickness. Density of V- defects, effect of barrier width on the surface morphology and also on V-defect density will be presented and discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

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References

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