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Optical Properties Of Tantalum Oxide Films Deposited On BK7 Substrates By Excimer Laser Ablation

Published online by Cambridge University Press:  10 February 2011

S. Boughaba  and
M. U. Islam
S. Boughaba
Affiliation:
National Research Council Canada, Integrated Manufacturing Technologies Institute, 800 Collip Circle, London, Ontario Canada N6G 4X8
M. U. Islam
Affiliation:
National Research Council Canada, Integrated Manufacturing Technologies Institute, 800 Collip Circle, London, Ontario Canada N6G 4X8
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Abstract

Thin amorphous films of tantalum oxide were grown on borosilicate crown glass substrates by KrF excimer pulsed laser ablation of a Ta2O5 target, in an oxygen environment. The deposition was performed at a temperature of 250 or 400 °C, while the oxygen pressure was set in the range 5 to 30 mTorr. The optical properties of the tantalum oxide coatings, as evaluated by reflectance/transmittance spectrophotometry, were found to be dependent on the oxygen gas pressure. At a pressure of 5 mTorr, absorbing films were obtained, with extinction coefficients above 10−2 (at λ=633 nm), along with an optical energy band-gap as low as 0.7 eV. At a pressure of 10 mTorr and above, the coatings had refractive indices up to 2.25 (at λ=633 nm), extinction coefficients below 10−4 (for λ>390 nm), and an optical energy band-gap in the range 3.9 to 4.0 eV.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 617: Symposium J – Laser-Solid Interactionsfor Materials Processing , 2000 , J3.7
Copyright
Copyright © Materials Research Society 2000

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References

1 - Harrop, P. J. and Campbell, D. S., Thin Solid Films 2, 273–292 (1968).Google Scholar
2 - Traylor-Kruschwitz, J. D. and Pawlewicz, W. T., Appl. Optics 36(10), 2157 (1997).Google Scholar
3 - Chaneliere, C., Autran, J. L., Devine, R. A. B., and Balland, B., Materials Science and Engineering R22, 269–322 (1998).Google Scholar
4 - Rubio, F., Denis, J., Albella, J. M., and Martinez-Duart, J. M., Thin Solid Films 90, 405–408 (1982).Google Scholar
5 - Blouke, M. M., Nelson, M. D., Serra, M., Knoesen, A., Higgins, B. G., Delamere, W. A., Womack, G., Flores, J. S., Duncan, M., Reed, R., in High Resolution Sensors and Hybrid Systems, edited by Blouke, M. M., Chang, W. C., Khosla, R. P., Thorpe, L. J., SPIE Proc. 1656 (SPIE, Bellingham, WA, 1992), pp. 497–507.Google Scholar
6 - Chu, A. K., Lin, H. C., and Cheng, W. H., J. Electronic Mater. 26(8), 889–892 (1997).Google Scholar
7 - Motohiro, T. and Taga, Y., Appl. Optics 28(13), 2466–2482 (1989).Google Scholar
8 - Hermann, W. C. Jr., J. Vac. Sci. Technol. 18(3), 1303–1305 (1981).Google Scholar
9 - Hashimoto, T. and Yoko, T., Appl. Optics 34(16), 2941–2948 (1995).Google Scholar
10 - Demiryont, H., Sites, J. R., and Geib, K., Appl. Optics 24(4), 490–495 (1985).Google Scholar
11 - Kukli, K., Aarik, J., Aidla, A., O. Kohan, Uustare, T., and Sammelselg, V., Thin Solid Films 260, 135–142 (1995).Google Scholar
12 - Strauss, G. N., Lechner, W., and Pulker, H. K., Thin Solid Films 351, 53–56 (1999).Google Scholar
13 - Ghodsi, F. E., Tepehan, F. Z., and Tepehan, G. G., Thin Solid Films 295, 11–15 (1997).Google Scholar
14 - Zhang, J.-Y., Fang, Q., and Boyd, I. W., Appl. Surf Sci. 138–139, 320–324 (1999).Google Scholar
15 - Boughaba, S., Islam, M. U., Sproule, G. I., and Graham, M. J., Surface & Coatings Technology 120–121, 757–764 (1999).Google Scholar
16 - Boughaba, S., Sproule, G. I., McCaffrey, J. P., Islam, M., and Graham, M. J., Thin Solid Films, 358(1-2), 104–113 (2000).Google Scholar