Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-29T07:56:58.990Z Has data issue: false hasContentIssue false

Optical Current DLTS with a Bipolar Rectangular Weighting Function for High-Resistivity Neutron Transmutation Doped Silicon

Published online by Cambridge University Press:  25 February 2011

Yutaka Tokuda
Affiliation:
Aichi Institute of Technology, Yakusa, Toyota, Aichi 470-03, Japan
Akira Usami
Affiliation:
Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, Aichi 466, Japan
Get access

Abstract

Defects in high-resistivity neutron transmutation doped (NTD) silicon without annealing were characterized by optical current DLTS with a bipolar rectangular weighting function using a GaAs LED. The DLTS method with a bipolar rectangular weighting function was also described. Two clear peaks labeled A and B were observed in addition to unresolved peaks due to overlaps of DLTS signals of several defects. The thermal emission activation energies of defects A and B were 0.15 and 0.50 eV, respectively. The DLTS signals of these defects were broader than the calculated ones. This indicates the clustered nature of defects produced by fast neutron irradiation. However, the fact that the characteristic peaks were observed suggests that the material state of high-resistivity NTD silicon is crystalline but not amorphous.

Type
Articles
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Gossick, B.R., J. Appl. Phys. 30, 1214 (1959).Google Scholar
2. Stein, H.J., in Neutron Transmutation Doping in Semiconductors, edited by Meese, J.M. (Plenum Press, New York, 1979) p. 229.Google Scholar
3. Young, R.T., Cleland, J.W., Wood, R.F. and Abraham, N.M., J. Appl. Phys. 49, 4752 (1978).Google Scholar
4. Lang, D.V., J. Appl. Phys. 45, 3023 (1974).Google Scholar
5. Tokuda, Y., Shimizu, N. and Usami, A., Jpn. J. Appl. Phys. 18, 309 (1979).Google Scholar
6. Tokuda, Y. and Usami, A., IEEE Trans. Nucl. Sci. NS–28, 3564 (1981).Google Scholar
7. Tokuda, Y. and Usami, A., IEEE Trans. Nucl. Sci. NS–29, 1388 (1982).Google Scholar
8. Tokuda, Y. and Usami, A., Jpn. J. Appl. Phys. 22, 371 (1983).Google Scholar
9. Tokuda, Y. and Usami, A., J. Appl. Phys. 57, 2325 (1985).Google Scholar
10. Guldberg, J., Appl. Phys. Lett. 31, 578 (1977).Google Scholar
11. Ch. Hurtes, Boulou, M., Mitonneau, A. and Bois, D., Appl. Phys. Lett. 32, 821 (1978).Google Scholar
12. Kimerling, L.C., IEEE Trans. Nucl. Sci. NS–23, 1497 (1976).Google Scholar