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Optical and Electrical Properties of Cr-SiO Thin Films for Flat Panel Displays

Published online by Cambridge University Press:  21 March 2011

Richard Wood ,
Peter Hofstra  and
David Johnson
Richard Wood
Affiliation:
Luxell Technologies Inc. 5170A Timberlea Blvd Mississauga, CANADA, L4W 2S5
Peter Hofstra
Affiliation:
Luxell Technologies Inc. 5170A Timberlea Blvd Mississauga, CANADA, L4W 2S5
David Johnson
Affiliation:
Luxell Technologies Inc. 5170A Timberlea Blvd Mississauga, CANADA, L4W 2S5
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Abstract

Low temperature fabrication of transparent conducting materials is a key issue in flat panel display production. Though Cr-SiO cermet thin films have predominantly been used as thin film resistors in a variety of microelectronics applications, it is shown in this paper that the material can successfully be used as a transparent to semi-transparent conductor in some applications if the value of the extinction coefficient, k, can be kept low (<0.3). Thus, a detailed study of the interdependence of the resistivity and optical properties of Cr-SiO is presented for the first time within the context of its use in the flat panel display industry. Specifically, Cr-SiO can be employed as part of Luxell's optical interference structure, known as the Black Layer™, US patent 5,049,780, used to increase contrast in TFEL and OLED displays.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 667: Symposium G – Luminescence and Luminescent Materials , 2001 , G7.5
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Thomas, L. K., Pekruhn, W., Chunhe, T. and Schroder, A., Solar Energy Mater. 16(1-3) 133 (1987).Google Scholar
2. Milosavljevic, M., Nenadovic, T. M., Bibic, N. and Dimitrijevic, T., Thin Solid Films 101(2) 167 (1983).Google Scholar
3. Taylor, A. G., Thurstans, R. E. and Oxley, D. P., J. Phys. E: Sci. Instrum. 17 755 (1984).Google Scholar
4. Fronz, V., Rosner, B. and Storch, W., Thin Solid Films 65 33 (1980).Google Scholar
5. Schabowska, E. and Scigala, R., Thin Solid Films 135 149 (1986).Google Scholar
6. Schabowska-Osiowska, E., Scigala, R. and Porada, Z., Vacuum 37 119 1987.Google Scholar
7. Bertoti, I., Toth, A., Mohai, M., Kelly, R., Marletta, G., Farkas-Jahnke, M., Nucl. Instr. and Meth. B 122 510 (1997).Google Scholar
8. Bertoti, I., Toth, A., Mohai, M., Kelly, R., Marletta, G., Nucl. Instr. and Meth. B 116 200 (1996).Google Scholar