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On the use of Secondary Ion Mass Spectrometry in Semiconductor Device Materials and Process Development

Published online by Cambridge University Press:  22 February 2011

Charles W. Magee  and
Ephraim M. Botnick
Charles W. Magee
Affiliation:
RCA Laboratories, Materials Characterization Research, Princeton, NJ 08540
Ephraim M. Botnick
Affiliation:
RCA Laboratories, Materials Characterization Research, Princeton, NJ 08540
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Abstract

This paper describes how secondary ion mass spectrometry can be used effectively in semiconductor device materials and process development. A short overview of the experimental technique is given followed by applications in the following areas:

1) Basic research

2) New Process Development

3) Trouble-shooting current processing

4) Analysis of competitor's devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 48: Symposium E – Applied Materials Characterization , 1985 , 229
Copyright
Copyright © Materials Research Society 1985

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References

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