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On the Epitaxy of Metal Films on GaN
Published online by Cambridge University Press: 10 February 2011
Abstract
A variety of metal films deposited at room temperature have been found to grow epitaxially under conventional vacuum conditions on GaN grown by metalorganic vapor phase epitaxy on sapphire substrates. The metal films have been characterized by X-ray diffraction using a thin-film Read camera and by MeV ion channeling measurements. Lattice mismatch between the epitaxial metals and the GaN basal planes ranges from ∼ 0.2% to ∼ 22%, and does not appear to be the determining factor in the epitaxy reported here. Surface structure of the epitaxial metal films has been studied by atomic force microscopy and found to differ considerably from that of nonepitaxial metal films grown on similar GaN substrates.
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- Copyright © Materials Research Society 1997
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