Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-11-25T16:31:56.979Z Has data issue: false hasContentIssue false

Ohmic Contact Behavior of Pt/Ni/Au to p-ZnO

Published online by Cambridge University Press:  01 February 2011

Ji-Myon Lee
Affiliation:
[email protected], Sunchon National University, Materials Science and Metallurgical Engineering, 315 Maegok-dong, Sunchon, Chonnam, 540-742, Korea, Republic of, 82-61-750-3550
Kyoung-Kook Kim
Affiliation:
[email protected], AIST, Tsukuba, Ibaraki, 305-8568, Japan
Hitoshi Tampo
Affiliation:
[email protected], AIST, Tsukuba, Ibaraki, 305-8568, Japan
Akimasa Yamada
Affiliation:
[email protected], AIST, Tsukuba, Ibaraki, 305-8568, Japan
Shigeru Niki
Affiliation:
[email protected], AIST, Tsukuba, Ibaraki, 305-8568, Japan
Get access

Abstract

The electrical properties of single Pt (30 nm) and Pt (30 nm)/Ni (30nm)/Au(50nm) multilayer contacts on moderately doped p-ZnO (Na = 5.0 × 1017 /−3) were investigated. Although linear current-voltage characteristics were observed for all samples, a sample that was annealed for 1 min at a temperature above 500 °C resulted in an ohmic contact with good characteristics. The best ohmic contact to p-type ZnO was obtained using a Pt/Ni/Au multilayer contact that was annealed at 600 °C for 1 min under a N2 ambient, showing a specific contact resistance Rc of 1.97 × 10−5 Ω cm2. The fundamental mechanisms for the lower contact resistivity of Pt/Ni/Au contacts are discussed based on glancing angle x-ray diffraction results and Auger depth profile analysis of the multilayer alloying process. Furthermore, we fabricated a ZnO p-n homojunction using Pt/Ni/Au and Ti/Au as the p-type and n-type ohmic contact metal, respectively. The threshold voltage was determined to be about 3.7 V, comparable to the bandgap energy of ZnO.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Pearton, S. J., Norton, D. P., Ip, K., Heo, Y. W., and Steiner, T., J. Vac. Sci. Technol. B 22 932 (2004).Google Scholar
2. Look, D. C., Claflin, B., Alivov, Ya. I., and Park, S. J., Phys. Stat. Sol. (a) 201, 2203 (2004).Google Scholar
3. Gruber, T., Kirchner, C., Kling, R., and Reuss, F., and Waag, A., Appl. Phys. Lett. 84, 5359 (2004).Google Scholar
4. Park, S. J., European Materials Research Society (E-MRS) 2005 spring meeting, Strasbourg, France, May 31 – June 3, 2005.Google Scholar
5. Tsukazaki, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S. F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. , Koinuma and Kawasaki, M., Nat. Mater. 4, 42 (2005).Google Scholar
6. Lin, M. E., Ma, Z., Huang, F. Y., Fan, Z. F., Allen, L. H., and Morkoc, H., Appl. Phys. Lett. 64, 1003 (1994).Google Scholar
7. Lin, Y.-J. and Lee, C. T., Appl. Phys. Lett. 77, 3986 (2000).Google Scholar
8. Lee, J. M., Kim, K. K., Park, S. J., and Choi, W. K., Appl. Phys. Lett. 78, 3842 (2001).Google Scholar
9. Ip, K., Thaler, G. T., Yang, H., Han, S. U., Li, Y., Norton, D. P., Pearton, S. J., Jang, S., and Ren, F., J. Cryst. Growth, 287, 149 (2006).Google Scholar
10. Lim, J. H., Kim, K. K., Hwang, D. K., Kim, H. S., Oh, J. Y., and Park, S. J., J. Electrochem. Soc. 152, G179 (2005)Google Scholar
11. Kim, S. H., Maeng, J. T., Choi, C. J., Leem, J. H., Han, M. S., and Seong, T. Y., Electrochem. Solid State Lett. 7, G167 (2005).Google Scholar
12. Kim, K. K., Kim, H. S., Hwang, D. K., Lim, J. H., and Park, S. J., Appl. Phys. Lett. 83, 63 (2003).Google Scholar
13. Rhoderick, E. H. and Williams, R. H., Metal-Semiconductor Contacts, p. 117, Clarendon Press, Oxford, (1988).Google Scholar
14. CRC Handbook of Chemistry and Physics, 83rd ed., Lide, D. R., Editor, CRC press, Boca Raton (2002).Google Scholar
15. Hansen, M., Constitution of Binary Alloys, 2nd Ed., McGraw Hill, New York (1958)Google Scholar
16. Chen, Z. X., Neyman, K. M., Gordienko, A. B., and Rosch, N., Phys. Rev. Lett. B 68, 075417 (2003).Google Scholar
17. Uhlig, H. H., MacNairn, J. S., and Vaughn, D. A., Acta. Met. 3, 302 (1955).Google Scholar
18. Roberts, S. and Gorte, R. J., J. Chem. Phys. 93, 5337 (1990).Google Scholar