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Observation of Film Growth Phenomena Using Micromachined Structures

Published online by Cambridge University Press:  10 February 2011

F. DiMeo Jr. ,
R. E. Cavicchi ,
S. Sernancik ,
J. S. Suchle ,
N. H. Tea  and
J. T. Kelliher
F. DiMeo Jr.
Affiliation:
Process Measurements Division, steves @nist.gov.frank.dimeo @ nist.gov
R. E. Cavicchi
Affiliation:
Process Measurements Division, steves @nist.gov.frank.dimeo @ nist.gov
S. Sernancik
Affiliation:
Process Measurements Division, steves @nist.gov.frank.dimeo @ nist.gov
J. S. Suchle
Affiliation:
Semiconductor Electronics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
N. H. Tea
Affiliation:
Semiconductor Electronics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
J. T. Kelliher
Affiliation:
Microelectronics Research Laboratory, Columbia, MD 21045
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Abstract

A method of studying thin film growth and materials processing using micromachined Si-based structures is presented. The microsubstrate platforms (called “microhotplates”) allow temperature control during deposition, and in situ monitoring of the electrical properties of connected coatings. The efficiency of the approach is amplified when multiple. Independentlyoperated elements are used in array configurations. Illustrations here involve chemical vapor deposition of semiconducting oxides, but the methodology can be employed to investigate the growth of other classes of materials as well.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 69
Copyright
Copyright © Materials Research Society 1997

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References

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