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Novel Technique to Produce Strongly Adherent Diamond Films on Fe- and Ni-Base Alloys

Published online by Cambridge University Press:  10 February 2011

Othon R. Monteiro
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
Zhi Wang
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
Ian G. Brown
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
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Abstract

An evaluation of the use of intermediate layers for promoting adhesion between diamond and Fe and Ni base alloys is presented. The lack of adhesion between diamond and such alloys has prevented its use as a protective coating in applications at intermediate temperatures. In this study we use a combination of plasma assisted deposition techniques together with controlled bias of the substrate in order to deposit intermediate layers, and simultaneously achieve a thorough intermixing of the elements at the interface, in order to increase the adhesion between the layers. We have compared the performance of different carbide forming metals, as well as other materials. Properties considered in the selection of the appropriate intermediate layers are: chemical affinity with carbon, thermal expansion coefficient, mechanical properties, and adhesion to diamond and to the base metal as well. In the case of multiple layers, adhesion strength was measured after every new layer was deposited, in order to identify any weak links of the composite structure. Transmission electron microscopy was used to determine the microstructure and phases. An analysis is provided of the resulting performance on the basis of the microstructure.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1. Fayer, A., Golzman, O. and Hoffman, A., Appl. Phys. Lett. 67, p. 22992302 (1995).Google Scholar
2. Weiser, P. S., Prawer, S., Manory, R. R., Hoffman, A., Evans, P. J., Paterson, P. J. K., Surface and Coatings Technol. 71, p. 167174 (1995).Google Scholar
3. Lorenz, H. P., Diamond and Related Materials 4, p. 10881092 (1995).Google Scholar
4. Chen, H., Nielsen, M. L., Gold, C. J., Dillon, R. O., DiGeorgio, J. and Furtak, T., Thin Solid Films 212, p. 169172 (1992).Google Scholar
5. Ralchenko, V. G., Smolin, A. A., Pereverzev, V. G., Obraztsova, E. D., Korotoushenko, K. G., Konov, V. I., Lakhotkin, Y. V., Loubnin, E. N., Diamond and Related Materials 4, p. 754758 (1995).Google Scholar
6. Schaefer, L., Bluhm, A., Sattler, M., Six, R. and Klages, C.-P., in Applications of Diamond Films and Related Materials: Third International Conference, edited by Feldman, A., Tzeng, Y., Yarbrough, W. A., Yoshikawa, M. and Murakawa, M., (1995) p. 399402.Google Scholar
7. Nesladek, M., Asinari, C., Spinnewyn, J., Lebout, R., Lorent, R. and D'Olieslaeger, M., Diamond and Related Materials 3, p. 912916 (1994).Google Scholar
8. Schwarzbach, D., Haubner, R. and Lux, B., Diamond and Related Materials 3, p. 757764 (1994).Google Scholar
9. Wanlu, W., Kejun, L., Jinying, G. and Aimin, L., Thin Solid Films 215, p. 174178 (1992).Google Scholar
10. Koskinen, J., Hirvonen, J.-P., Hannula, S.-P., Pischow, K., Kattelus, H. and Suni, I., Diamond and Related Materials 3, p. 11071111 (1994).Google Scholar
11. Feng, Z., Anders, S., Anders, A., IIIAger, J. W., Brown, I. G., Komvopoulos, K., and Bogy, D., submitted to Diamond and Related Materials (1995).Google Scholar
12. Brown, I. G., Anders, A., Anders, S., Dickinson, M. R., MacGuill, R. A., Monteiro, O. R., Oks, E. M., Raoux, S., Wang, Z. and Yushkov, G., Mat. Res. Soc. Fall Meeting 1995 (invited).Google Scholar
13. Anders, S., Anders, A. and Brown, I. G., Rev. Sci. Instr. 65, p. 12531258 (1994).Google Scholar
14. Anders, A., Anders, S. and Brown, I. G., Plasma Sources Sci. Technol. 4, p. 112 (1995).Google Scholar
15. Anders, S., Raoux, S., Krishnan, K., MacGill, R. and Brown, I. G., submitted to J. Appl. Phys. (1995).Google Scholar
16. Brewer, M. A., Brown, I. G., Dickenson, M. R., Galvin, J. E., MacGill, R. A. and Salvadori, M. C., Rev. Sci. Instrum. 63, p. 33893393 (1992).Google Scholar