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Novel Methods for Deposition of Boron Carbide Films

Published online by Cambridge University Press:  21 February 2011

J. Mazurowski ,
S. Baral-Tosh ,
G. Ramseyer ,
J.T. Spencer ,
Yoon-Gi Kim  and
P.A. Dowben
J. Mazurowski
Affiliation:
Department of Physics, Syracuse University, Syracuse, New York 13244–1130 General Electric Co., Electronics Laboratory, Electronics Park, Syracuse, New York, 13221
S. Baral-Tosh
Affiliation:
Department of Physics, Syracuse University, Syracuse, New York 13244–1130
G. Ramseyer
Affiliation:
General Electric Co., Electronics Laboratory, Electronics Park, Syracuse, New York, 13221
J.T. Spencer
Affiliation:
Department of Chemistry, Syracuse University, Syracuse, New York 13244–4100
Yoon-Gi Kim
Affiliation:
Department of Physics, Syracuse University, Syracuse, New York 13244–1130
P.A. Dowben
Affiliation:
Department of Physics, Syracuse University, Syracuse, New York 13244–1130
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Abstract

By combining pentaborane (B5H9) and decarborane (B10H14) with methanein a plasma reactor, a variety of boron-carbides can be made over a wide range of compositions. The resulting thin films have uniform composition and appear to be polycrystalline.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 190: Symposium M – Plasma Processing and Synthesis of Materials III , 1990 , 101
Copyright
Copyright © Materials Research Society 1991

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References

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