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A Novel Method for Determining the Curie Temperature of Ferroelectric Films

Published online by Cambridge University Press:  21 February 2011

Chi Kong Kwok  and
Seshu B. Desu
Chi Kong Kwok
Affiliation:
Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061
Seshu B. Desu
Affiliation:
Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061
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Abstract

A novel technique to measure the Curie temperature of ferroelectric thin films has been developed. The method is based on identifying changes in slope of film stress vs temperature plot. At the Curie temperature, ferroelectric films undergo a phase transition from ferroelectric phase to paraelectric phase. Due to this phase transformation, physical properties of films such as elastic constants and coefficients of thermal expansion also change at the Curie temperature. Consequently, at this temperature the temperature coefficient of film stress changes since it is related to elastic constants and thermal expansion coefficient. Thus, by measuring the film stress as a function of temperature, the Curie temperature can be determined. The Curie temperatures measured by this method are in good agreement with the literature values. Small discrepancies that were observed can be attributed to the intrinsic stresses present in the films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 310: Symposium N – Ferroelectric Thin Films III , 1993 , 429
Copyright
Copyright © Materials Research Society 1993

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References

1) Sheppard, L.M., Ceram. Bull., 71, 85 (1992).Google Scholar
2) Haertling, G.H., Ferroelectrics, 75, 25 (1987).CrossRefGoogle Scholar
3) Arlt, G., Hennings, D. and With, A. de, J. Appl. Phys., 58, 1619 (1985).Google Scholar
4) Desu, S.B., J. Electrochem.Soc., in press.Google Scholar
5) Stoney, G., Proc. R. Soc. (London) A82, 172 (1909).Google Scholar
6) Blum, J. and Gurkovich, S., J. of Mat. Sci. 20, 4479 (1985).CrossRefGoogle Scholar
7) Kwok, Chi Kong, Ph. D. Dissertation, Virginia Polytechnic Institute & State University, July 1992.Google Scholar
8) Landolt-Bornstein Series, Vol. 3. Ferro- and antiferroelectric substances, Hellwege, K., ed. (Springer-Verlag, Berlin, 1969), pp.269.Google Scholar