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Nexafs Studies of Unsaturated Carboxylic Acids and Alcohols Adsorbed on the Si(111)(7×7) Surface

Published online by Cambridge University Press:  26 February 2011

D. A. Outka
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
J. Stöhr
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
R. J. Madix
Affiliation:
Department of Chemical Engineering, Stanford University, Stanford, CA 94305
H. H. Rotermund
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
B. Hermsmeier
Affiliation:
Department of Chemistry, University of Hawaii, Honolulu, HI 96822
J. Solomon
Affiliation:
Department of Chemical Engineering, Stanford University, Stanford, CA 94305
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Abstract

The adsorption of formic acid (HCOOH), acrylic acid (CH2= CHCO2H), propiolic acid (HC=CCO2H), and the corresponding alcohols on the Si(111)(7×7) surface have been investigated by NEXAFS. In each case, well-defined dipole transitions to σ* and π* molecular orbital s were observed above the C and 0 K-edges and used to probe the orientation and chemistry of these molecules on this silicon surface. Monolayer coverages of these molecules on silicon, bond strongly to the silicon surface via the carboxylic acid or alcohol group. In contrast, the C-C double and triple bonds of these molecules do not react initially with the silicon surface. Upon heating, however, the C-C double and triple bonds which are held in proximity to the surface by the carboxylic acid or alcohol group, are lost either by polymerization on the surface or reaction with the silicon substrate. These results illustrate the capabilities of NEXAFS to investigate molecular orientations on surfaces and the electronic structure of polyatomic adsorbates.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

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References

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