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A New Purged UV Spectroscopic Ellipsometer to characterize 157nm nanolithographic materials

Published online by Cambridge University Press:  10 February 2011

Pierre Boher ,
Jean Philippe Piel ,
Patrick Evrard  and
Jean Louis Stehle
Pierre Boher
Affiliation:
SOPRA S.A., 26 rue Pierre Joigneaux, 92270 BOIS COLOMBES, France.
Jean Philippe Piel
Affiliation:
SOPRA S.A., 26 rue Pierre Joigneaux, 92270 BOIS COLOMBES, France.
Patrick Evrard
Affiliation:
SOPRA S.A., 26 rue Pierre Joigneaux, 92270 BOIS COLOMBES, France.
Jean Louis Stehle
Affiliation:
SOPRA S.A., 26 rue Pierre Joigneaux, 92270 BOIS COLOMBES, France.
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Abstract

Spectroscopic ellipsometry has long been recognized as the technique of choice to characterize thin films and multilayers. It is now intensively used in microelectronics and especially for the microlithographic applications. Instrumentation for the next generation of UV lithography at 157nm requires special optical setup since oxygen and water are extremely absorbing below 190nm. The ellipsometer discussed in this paper works into a purged glove box to reduce the oxygen and water contamination in the part per million ranges. The optical setup has been especially studied for microlithographic applications. It includes for example a premonochromator in the polariser arm to avoid resist photobleaching. Technical details of the system and some first measurement results on substrates and thin films are reported hereafter.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 584 , 1999 , 177
Copyright
Copyright © Materials Research Society 2000

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