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New Photoresists with Photoacid Generator in the Backbone

Published online by Cambridge University Press:  15 March 2011

Hengpeng Wu  and
Kenneth E. Gonsalves
Hengpeng Wu
Affiliation:
AZ Electronic Materials, Clariant Corporation, 70 Meister, Somerville, NJ 08876
Kenneth E. Gonsalves
Affiliation:
Dept. of Chemistry & Cameron Applied Research Center, University of North Carolina, Charlotte, NC 28223
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Abstract

A photoacid generating (PAG) sulfonium monomer was designed and synthesized. CA resists were prepared based on this PAG monomer. Incorporation of the PAG in the resist backbone offered a few advantages such as high sensitivity and absence of phase separation. These resists proved to be especially useful for low-voltage EB lithography.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 705: Symposium Y – Nanopatterning–From Ultralarge-Scale Integration to Biotechnology , 2001 , Y2.3
Copyright
Copyright © Materials Research Society 2002

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