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A New Low Temperature Thin Film Deposition Process: Energetic Cluster Impact (ECI)

Published online by Cambridge University Press:  21 February 2011

H. Haberland ,
M. Leber ,
M. Moseler ,
Y. Qiang ,
O. Rattunde ,
T. Reiners  and
Y. Thurner
H. Haberland
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
M. Leber
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
M. Moseler
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
Y. Qiang
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
O. Rattunde
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
T. Reiners
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
Y. Thurner
Affiliation:
Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany
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Abstract

A beam of metal cluster ions of variable size is deposited with variable kinetic energy on a substrate. Mirror-like and strongly adhering films are produced on unheated substrates for sufficiently high cluster impact energies. Numerical simulations provide the physical insight why this novel technique gives different, and sometimes superior results compared to conventional methods. Several examples are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 388: Symposium Q – Film Synthesis and Growth Using Energetic Beams , 1995 , 207
Copyright
Copyright © Materials Research Society 1995

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References

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