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A new Apparatus for Dynamical Ion Beam Mixing

Published online by Cambridge University Press:  25 February 2011

M. Jaulin ,
G. Laplanche ,
J. Delafond  and
S. Pimbert-Michaux
M. Jaulin
Affiliation:
Laboratoire de Métallurgie Physique (U.A. 131, CNRS), 40, Avenue du Recteur Pineau 86022 POITIERS (France)
G. Laplanche
Affiliation:
Laboratoire de Métallurgie Physique (U.A. 131, CNRS), 40, Avenue du Recteur Pineau 86022 POITIERS (France)
J. Delafond
Affiliation:
Laboratoire de Métallurgie Physique (U.A. 131, CNRS), 40, Avenue du Recteur Pineau 86022 POITIERS (France)
S. Pimbert-Michaux
Affiliation:
UNIREC B.P. 50, 42702 FIRMINY (France)
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Extract

A new apparatus for dynamical ion beam mixing has been developed in our laboratory. The system is based on deposition by ion beam sputtering concurrently with ion beam implantation. It operates under a vacuum of 10−5 Pa before deposition and 10−3 Pa during deposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 91
Copyright
Copyright © Materials Research Society 1989

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References

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