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A new Apparatus for Dynamical Ion Beam Mixing
Published online by Cambridge University Press: 25 February 2011
Extract
A new apparatus for dynamical ion beam mixing has been developed in our laboratory. The system is based on deposition by ion beam sputtering concurrently with ion beam implantation. It operates under a vacuum of 10−5 Pa before deposition and 10−3 Pa during deposition.
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- Copyright © Materials Research Society 1989