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Nature and Excitation Mechanism of the Emission-dominating Minority Eu-center in GaN Grown by Organometallic Vapor-phase Epitaxy

Published online by Cambridge University Press:  07 July 2011

Jonathan Poplawsky ,
Nathaniel Woodward ,
Atsushi Nishikawa ,
Yasufumi Fujiwara  and
Volkmar Dierolf
Jonathan Poplawsky
Affiliation:
Physics, Lehigh University, Bethlehem, Pennsylvania, U.S.A.
Nathaniel Woodward
Affiliation:
Physics, Lehigh University, Bethlehem, Pennsylvania, U.S.A.
Atsushi Nishikawa
Affiliation:
Division of Materials and Manufacturing Science, Osaka University, Osaka, Japan.
Yasufumi Fujiwara
Affiliation:
Division of Materials and Manufacturing Science, Osaka University, Osaka, Japan.
Volkmar Dierolf
Affiliation:
Physics, Lehigh University, Bethlehem, Pennsylvania, U.S.A.
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Abstract

In-situ doped Eu ions in GaN grown by Organometallic Vapor-phase Epitaxy (OMVPE) at different pressures were investigated under different excitation methods and through the use of the following experimental techniques: (1) resonant site-selective laser irradiation (2) electron beam excitation, and (3) a dual excitation using a combination of electron beam and laser irradiation. With these means, we have examined the difference in the excitation pathways that result from resonant laser and electron hole (e-h) pair excitation of Eu ions for two different distinct incorporation sites, which are responsible for most of the luminescence. We have obtained clear evidence that e-h pairs do not have the ability to excite all of the ions and that there is excitation trapping by defects involved in the Eu excitation.

Keywords

EuluminescenceIII-V
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1342: Symposium V – Rare-Earth Doping of Advanced Materials for Photonic Applications , 2011 , mrss11-1342-v03-04
Copyright
Copyright © Materials Research Society 2011

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References

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