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Nanostructure Study of Ti/TiN Multilayers: Effect of the Deposition Temperature

Published online by Cambridge University Press:  10 February 2011

S. Labdi ,
C. Sant ,
L. Hennet  and
Ph. Houdy
S. Labdi
Affiliation:
L.M.N., Université d'Evry Val d'Essonne, Boulevard des Coquibus, 91025 Evry cedex, France.
C. Sant
Affiliation:
L.M.N., Université d'Evry Val d'Essonne, Boulevard des Coquibus, 91025 Evry cedex, France.
L. Hennet
Affiliation:
L.P.M., Université Henri Poincaré, Nancy 1, 54506 Vandoeuvre Les Nancy cedex, France.
Ph. Houdy
Affiliation:
L.M.N., Université d'Evry Val d'Essonne, Boulevard des Coquibus, 91025 Evry cedex, France.
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Abstract

In this paper, we report on the growth and the study of Ti/TiN nanometric multilayers. The preparation of these films has been carried out by high vacuum diode r.f. sputtering. Growth was in-situ monitored by kinetic ellipsometry. Deposition temperature was kept to room and low temperature (-120°C) respectively in order to modify the interface properties and consequently to understand the effect of the interfaces on the film's mechanical properties.

The thickness of each layer was varied from 1 nm to 10 nm and alternately repeated in order to obtain a total thickness of 200 nm. After deposition, films were characterized by means of X-ray diffraction and grazing X-ray reflectometry for structural determination. This study shows that the TiN-Ti boundary is composed of TiNx, with x going from the nominal nitrogen concentration of the TiN layer to 0. This can be due either to a surface reaction of the incident titanium during the Ti sequence with the nitrogen present at the film surface or to a reaction of nitrogen with the target surface during the TiN sequence.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 711
Copyright
Copyright © Materials Research Society 1997

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