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Published online by Cambridge University Press: 17 March 2011
Striking differences have been observed in the deformation modes associated with 2mN constant load nanoscratch events on ultrathin Cr layers deposited on SiOx with and without a dendrimer interlayer. In the absence of the dendrimer distinct ridge formation along the wear track indicative of plowing and wedge formation are observed. By contrast, dendrimer monolayer-mediated films exhibit ridgeless scratches apparently formed in a nearly pure cutting mode. In addition, the width of the scratch trench in the sample without dendrimer is larger than the one with dendrimer.