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Nanopatterning and Nanomachining with Table-top Extreme Ultraviolet Lasers

Published online by Cambridge University Press:  01 February 2011

Mario Marconi ,
Przemyslaw Wojciech Wachulak ,
Maria Gabriela Capeluto ,
Georgyi Vaschenko ,
Herman Bravo ,
Carmen S Menoni ,
Jorge Rocca ,
Erik H Anderson ,
Weilun Chao  and
David Attwood
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Mario Marconi
Affiliation:
[email protected], Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States, 970-491-8299, 970-4918671
Przemyslaw Wojciech Wachulak
Affiliation:
[email protected], Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Maria Gabriela Capeluto
Affiliation:
[email protected], Universidad de Buenos Aires, Departamento de Fisica, Facultad de Ciencias Exactas, Ciudad Universitaria-Pabellon 1, Buenos Aires, C1428EHA, Argentina
Georgyi Vaschenko
Affiliation:
[email protected], Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Herman Bravo
Affiliation:
[email protected], Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Carmen S Menoni
Affiliation:
[email protected], Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Jorge Rocca
Affiliation:
[email protected], Colorado State University, Electrical and Computer Engineering, 1373 Campus Delivery, Fort Collins, CO, 80523, United States
Erik H Anderson
Affiliation:
[email protected], Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, United States
Weilun Chao
Affiliation:
[email protected], Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, United States
David Attwood
Affiliation:
[email protected], Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, United States
Oscar Hemberg
Affiliation:
[email protected], JMAR Technologies Inc., San Diego, CA, 92127, United States
Bradley Frazer
Affiliation:
[email protected], JMAR Technologies Inc., San Diego, CA, 92127, United States
Scott Bloom
Affiliation:
[email protected], JMAR Technologies Inc., San Diego, CA, 92127, United States
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Abstract

Nanopatterning and nanomachining of PMMA coated wafers was performed using table top extreme ultraviolet lasers. Features below 100 nm were imprinted with short (50-60 s) exposure times.

Keywords

nanoscalelaser ablationlithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O06-05
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1. Brueck, S.R.J., Proceedings Of The Ieee, 2005. 93: p. 1704–1721.Google Scholar
2. Brueck, S.R.J., Zaidi, S.H., Chen, X., and Zhang, Z., Microelectron. Eng., 1998. 42, 145.Google Scholar
3. Fernandez, A., Decker, J.Y., Herman, S.M., Phillion, D.W., Sweeney, D.W., and Perry, M.D., Journal Of Vacuum Science & Technology B, 1997. 15: p. 2439–2443.Google Scholar
4. Hoffnagle, J.A., Hinsberg, W.D., Sanchez, M., and Houle, F.A., Journal Of Vacuum Science & Technology B, 1999. 17: p. 3306–3309.Google Scholar
5. Solak, H.H., Journal Of Physics D-Applied Physics, 2006. 39: p. R171–R188.Google Scholar
6. Switkes, M., Bloomstein, T.M., and Rothschild, M., Appl. Phys. Lett., 2000. 77, 3149.Google Scholar
7. Switkes, M. and Rothschild, M., J. Of Vac. Sci. & Techno. B, 2001. 19,2353.Google Scholar
8. Solak, H.H., He, D., Li, W., and Cerrina, F., J. Of Vac. Sci. & Techno.B, 1999. 17,3052.Google Scholar
9. Solak, H.H. and David, C., J. Of Vac. Sci. & Techno. B, 2003, 21, 2883.Google Scholar
10. Solak, H.H., David, C., Gobrecht, J., Wang, L., and Cerrina, F., Journal Of Vacuum Science & Technology B, 2002. 20: p. 2844–2848.Google Scholar
11. Benware, B.R., Macchietto, C.D., Moreno, C.H., and Rocca, J.J., Physical Review Letters, 1998. 81: p. 5804–5807.Google Scholar
12. Macchietto, C.D., Benware, B.R., and Rocca, J.J., Optics Letters, 1999. 24: p. 1115–1117.Google Scholar
13. Avrutsky, I., Georgiev, D. G., Frankstein, D., Auner, G., and Newaz, G., Applied Physics Letters, 2004. 84: p. 2391–2393.Google Scholar
14. Chimmalgi, A., Grigoropoulos, C. P., and Komvopoulos, K., J. Of Appl. Phys., 2005. 97.Google Scholar
15. Korte, F., Serbin, J., Koch, J., Egbert, A., Fallnich, C., Ostendorf, A., and Chichkov, B.N., Applied Physics A-Materials Science & Processing, 2003. 77: p. 229–235.Google Scholar
16. Pronko, P. P., Dutta, S. K., Squier, J., Rudd, J. V., Du, D., and Mourou, G., Optics Communications, 1995. 114: p. 106–110.Google Scholar
17. Simon, P. and Ihlemann, J., Applied Surface Science, 1997. 110: p. 25–29.Google Scholar
18. Wysocki, G., Heitz, J., and Bauerle, D., Applied Physics Letters, 2004. 84: p. 2025–2027.Google Scholar
19. Capeluto, M. G., Vaschenko, G., Grisham, M., Marconi, M. C., Luduena, S., Pietrasanta, L., Lu, Y. F., Parkinson, B., Menoni, C. S., and Rocca, J. J., Ieee Transactions On Nanotechnology, 2006. 5: p. 3–7.Google Scholar
20. Solak, H. H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B. H., Yang, X. M., and Nealey, P., Applied Physics Letters, 1999. 75: p. 2328–2330.Google Scholar
21. Anderson, E. H., Ieee Journal Of Quantum Electronics, 2006. 42: p. 27–35.Google Scholar
22. "Soft X Rays and Extreme Ultraviolet Radiation". Attwood, D., Cambridge University Press, 2000.Google Scholar
23. McLellan, J. M., Geissler, M., Xia, Y. N., J. Of The Am. Chem. Soc., 2004. 126,10830.Google Scholar
24. Wang, Y.L. and Xia, Y.N., Nano Letters, 2004. 4, 2047–2050.Google Scholar
25. Zhu, F. Q., Fan, D. L., Zhu, X. C., Zhu, J. G., Cammarata, R. C., Chien, C. L., Advanced Materials, 2004. 16, 2155.Google Scholar
26. Chou, S.Y. and Krauss, P.R., Microelectronic Engineering, 1997. 35, 237–240.Google Scholar
27. Chou, S. Y., Krauss, P. R., Renstrom, P. J., J. Of Vac. Sci. & Techno. B, 1996. 14, 4129.Google Scholar