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Published online by Cambridge University Press: 01 February 2011
Recent studies in nanostructural characterization for on-chip interconnect applications using carbon nanofibers (CNFs) are presented. In this paper, we propose a novel technique, for the purpose of characterizing interfacial structures of vertically aligned CNFs for cross-sectional imaging with scanning transmission electron microscopy (STEM). In this technique, vertically aligned CNFs are selectively grown, by plasma-enhanced chemical vapor deposition (PECVD), on a substrate comprising a narrow strip (width ~100nm) fabricated by focused ion beam (FIB). Using high-resolution STEM, we show that CNFs with diameters ranging from 10 -100 nm exhibit very similar graphitic layer morphologies at the base contact interface.