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Nanocrystalline Undoped Silicon Films Produce by Hot Wire Plasma Assisted Technique

Published online by Cambridge University Press:  17 March 2011

Isabel M.M. Ferreira ,
Rodrigo F. P. Martins ,
Ana M. F. Cabrita ,
Elvira M. C. Fortunato  and
Paula Vilarinho
Isabel M.M. Ferreira
Affiliation:
CENIMAT, Departament of Materials Science of Faculty of Science and Technology of New University of Lisbon and CEMOP-UNINOVA, Quinta da Torre, 2825-114 Caparica (Portugal)
Rodrigo F. P. Martins
Affiliation:
CENIMAT, Departament of Materials Science of Faculty of Science and Technology of New University of Lisbon and CEMOP-UNINOVA, Quinta da Torre, 2825-114 Caparica (Portugal)
Ana M. F. Cabrita
Affiliation:
CENIMAT, Departament of Materials Science of Faculty of Science and Technology of New University of Lisbon and CEMOP-UNINOVA, Quinta da Torre, 2825-114 Caparica (Portugal)
Elvira M. C. Fortunato
Affiliation:
CENIMAT, Departament of Materials Science of Faculty of Science and Technology of New University of Lisbon and CEMOP-UNINOVA, Quinta da Torre, 2825-114 Caparica (Portugal)
Paula Vilarinho
Affiliation:
Department of Ceramic and Glass Engineering, UIMC, University Aveiro, 3810-193 Aveiro (Portugal).
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Abstract

In this work, we show results concerning electro-optical properties, composition and morphology of nanocrystalline hydrogenated undoped silicon (nc-Si:H) films produced by hot wire plasma assisted chemical vapour deposition process (HWPA-CVD) and exhibiting a compact granular structure, as revealed by SEM micrographs. This was also inferred by infrared spectra, which does not present the SiO vibration band located at 1050-1200 cm-1, even when samples have long atmospheric exposition. The photoconductivity measured at room temperature also does not change when samples have a long time exposition to the air or to the light irradiation. The influence of hydrogen dilution on the properties of the films was also investigated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 609: Symposium A – Amorphous & Heterogeneous Silicon Thin Films – 2000 , 2000 , A22.4
Copyright
Copyright © Materials Research Society 2000

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References

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