Hostname: page-component-586b7cd67f-tf8b9 Total loading time: 0 Render date: 2024-11-29T06:46:31.380Z Has data issue: false hasContentIssue false
  • English
  • Français

Multispectral Photonic Crystal Photo Sensor

Published online by Cambridge University Press:  01 February 2011

Xiaochen Sun ,
Juejun Hu ,
Ching-yin Hong ,
Jeff Viens ,
Rupa Das ,
Anuradha M. M. Agarwal  and
Lionel C. Kimerling
Xiaochen Sun
Affiliation:
[email protected], MIT, Materials Science, 77 Massachusetts Ave., 13-4153, Cambrige, MA, 02139, United States, 617-253-6907
Juejun Hu
Affiliation:
[email protected], MIT, Cambridge, MA, 02139, United States
Ching-yin Hong
Affiliation:
[email protected], MIT, Cambridge, MA, 02139, United States
Jeff Viens
Affiliation:
[email protected], MIT, Cambridge, MA, 02139, United States
Rupa Das
Affiliation:
[email protected], MIT, Cambridge, MA, 02139, United States
Anuradha M. M. Agarwal
Affiliation:
[email protected], MIT, Cambridge, MA, 02139, United States
Lionel C. Kimerling
Affiliation:
[email protected], MIT, Cambridge, MA, 02139, United States
Get access

Abstract

A novel photo sensor pixel using a one-dimensional (1D) photonic crystal structure incorporating photoconductive layers has been realized. The fabricated device exploits mode discrimination to provide simultaneous multispectral photo sensing capability. Resonant cavity enhancement (RCE) design allows the use of very thin photoconductive layer to achieve dramatically suppressed shot noise, as well as high quantum efficiency. Low cost amorphous silicon is used to be photoconductive material and the simply fabrication process is completely CMOS-compatible. Detectivities as high as 2.6×1010 cmHz1/2W−1 and 2.0×1010 cmHz1/2W−1 at the two pre-selected wavelengths, 632nm and 728nm, were achieved, respectively.

Keywords

Sioptoelectronicsensor
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 952: Symposium F – Integrated Nanosensors , 2006 , 0952-F02-03
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Albertz, J., Ebner, H., Neukum, G., International Archives of Photogrammetry and Remote Sensing, Vienna, Austria, 31, Part B4, 58–63, (1996).Google Scholar
2. Sandau, R., Eckardt, A., International Archives of Photogrammetry and Remote Sensing, Vienna, Austria, 31, Part B1, 170–175, (1996).Google Scholar
3. Baronti, S., Casini, A., Lotti, F., and Porcinai, S., Appl. Optics 37, 1299, (1998).Google Scholar
4. Seo, S.W., Geddis, D.L., and Jokerst, N.M., IEEE Photonics Tech. Lett. 15, 578, (2003).Google Scholar
5. Krapf, D., Adoram, B., Shappir, J., Saar, A., Thomas, S. G., Liu, J. L., and Wang, K. L., Appl. Phys. Lett. 78, 495 (2001).Google Scholar
6. Goldberg, A., Kennerly, S., Little, J., Shafer, T., Mears, C., Schaake, H., Winn, M., Taylor, M., and Uppal, P., Optical Engineering 42, 30 (2003).Google Scholar
7. Kock, A., Gornik, E., Abstretier, G., Bhom, G., Walther, M., and Weimann, G., Appl. Phys. Lett. 60, 2011 (1992).Google Scholar