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Multiple modes of laser-induced pattern formation in nanoscopic Co films

Published online by Cambridge University Press:  01 February 2011

Christopher Favazza
Affiliation:
[email protected], Washington University in St. Louis, Physics, 6029 Devonshire, St. Louis, MO, 63109, United States
Justin Trice
Affiliation:
[email protected], Washington University in St. Louis, Department of Physics, St. Louis, MO, 63130, United States
Radhakrishna Sureshkumar
Affiliation:
[email protected], Washington University in St. Louis, Department of Energy, Environmental and Chemical Engineering, St. Louis, MO, 63130, United States
Ramki Kalyanaraman
Affiliation:
[email protected], Washington University in St. Louis, Department of Physics, St. Louis, MO, 63130, United States
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Abstract

Dewetting instabilities in nanoscopic Co films, induced by uniform multiple ns pulse laser irradiation, leads to a system of nanoparticles with robust spatial order. On the other hand, irradiation by non-uniform laser intensity, such as with a two beam laser interference pattern generates a quasi two-dimensional pattern of nanoparticles possessing long range order (LRO) and short range order (SRO). Here we discuss the various instabilities that are responsible for the production of these dissimilar patterns and length scales on the basis of their time scales. For the case of single beam irradiation, the film progresses in a manner that can be attributed to classical spinodal dewetting. Pattern formation from interference irradiation is the result of time scale-based selection of competing processes, which can be chosen by controlling the film thickness. This approach promises a simple and cost-effective means to self-assemble various nanostructures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1. Reiter, G.. Phys. Rev. Lett. 68. 7578(1992)Google Scholar
2. Theile, U., Mertig, M., Pompe, W.. Phys. Rev. Lett. 80 (13). 28692872 (1998).Google Scholar
3. Seeman, R., Herminghaus, S., Jacobs, K.. Phys. Rev. Lett. 86. 5534 (2001).Google Scholar
4. Vrij, A.. Disc. Farad. Soc. 42. 2333 (1966).Google Scholar
5. Vrij, A., Overbeek, Th. G.. Amer, J.. Chem. Soc. 90 (12). 30743078 (1968).Google Scholar
6. Bischof, J., Scherer, D., Herminghaus, S., Leiderer, P.. Phys. Rev. Lett. 77 (8). 15361539 (1996).Google Scholar
7. Favazza, C., Kalyanaraman, R., Sureshkumar, R.. Nanotechnology 17 (2006).Google Scholar
8. Favazza, C., Trice, J., Krishna, H., Kalyanaraman, R., Sureshkumar, R.. App. Phys. Lett 88. (2006).Google Scholar
9. Favazza, C., Trice, J., Krishna, H., Kalyanaraman, R.. Laser-induced pattering of Co nanostructures under ambient conditions (Mater. Res. Soc. Symp. Proc. 890, Pittsburgh, PA, 2006).Google Scholar
10. Trice, J., Thomas, D., Favazza, C., Sureshkumar, R., Kalyanaraman, R.. Phys. Rev. B. (submitted 2006).Google Scholar
11. Rayleigh, Lord. Proc. London Math. Soc. 10. 413 (1878).Google Scholar
12. Rayleigh, Lord. Proc. Roy. Soc. London 29. 7197 (1879).Google Scholar
13. Eggers, J.. Rev. Mod. Phys. 69 865929 (1997).Google Scholar