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MULTILAYER X-RAY REFLECTORS: EFFECTS OF LAYER IMPERFECTIONS
Published online by Cambridge University Press: 28 February 2011
Abstract
Periodic multilayer structures, consisting of largely amorphous alternating layers of heavy and light elements, have been fabricated by sputtering techniques. Investigations have been carried out into the effects of various types of layer imperfections on the x-ray optical properties of these multilayers. These have included extensive numerical modeling of real multilayers (using a computational scheme based on the complete dynamical theory) with simulations of diffused interfaces and deviations from constant d-spacing. Results are presented for examples of W–C and Hf–Si multilayers, with comparison of measurements at Cu–K to the theoretical model.
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- Copyright © Materials Research Society 1986
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