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Multilayer Coatings and Optical Materials for Tuned Infrared Emittance and Thermal Control
Published online by Cambridge University Press: 10 February 2011
Abstract
Many thermal control applications require thin film coatings that emit or absorb strongly at near infrared and infrared wavelengths. One of the primary applications for these coatings is thermal control for surfaces and structures of spacecraft, which are exposed to solar radiation during at least 60% of their orbit, causing wide temperature fluctuations. Another recent application for this type of coating is infrared emissive imaging employing a fiber optic infrared scene projector. While single layer coatings can provide high emissivity in a broad wavelength band, multilayer coatings can be used to obtain higher emissivities over a narrow wavelength band. This band can be tuned to a specific range of temperatures and wavelengths. Coatings developed for thermal control have a reflective base layer, either ZrN or a refractory metal boride or silicide. These materials have increased durability compared to metal layers. The multilayer coating deposited over the based layer consists of an A1203/SiO2 stack with high emittance at 300 K (9.8 μm), and solar reflectance near 0.6. Multilayer tuned infrared absorber/emitter coatings are applied to fiber optic infrared scene projectors. The coatings consists of a three layer Si3N4/Cr/Si3N4 absorber tuned at the 1.06 μtm laser wavelength, and a six layer Cr/dielectric/Cr/dielectric/Cr/dielectric coating which emits strongly in either the 3 - 5 jim or the 8 - 12 μm infrared wavelength bands. Absorption bands of the coatings are independently tunable. All coatings are deposited by reactive DC and RF magnetron sputtering onto 2.5-in fiber optic faceplates. Either Si3N4, Si, or ZnS thin film dielectric materials were used in the emitter coatings. With an input laser power of 15 W, the coatings emit at a black body temperature 529 K, which compared well with predicted performance.
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- Copyright © Materials Research Society 1999
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