Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-19T22:52:04.839Z Has data issue: false hasContentIssue false
  • English
  • Français

Morphology of Vapor Evaporated Mo Thin Films

Published online by Cambridge University Press:  16 February 2011

Y. Cheng  and
M. B. Stearns
Y. Cheng
Affiliation:
Department of Physics, Arizona State University, Tempe, AZ 85287
M. B. Stearns
Affiliation:
Department of Physics, Arizona State University, Tempe, AZ 85287
Get access

Abstract

Studies were made of the dependence of the morphology of Mo films, prepared by ebeam evaporation in an UHV system, on the substrate temperature and deposition angle. The main characterization techniques used were large angle x-ray scattering and cross-sectional high resolution electron microscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 222: Symposium D – Atomic Layer Growth and Processing , 1991 , 351
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Mackenzie, J.K., Moore, A.J.K., and Nicholas, J.F., J. Phys. Chem. Solids, 23, 185 (1962).Google Scholar
2. Chang, C.-H., Ph. D. thesis, Arizona State University, 1989.Google Scholar
3. Lewen, G.D., MS thesis, Arizona State University, 1990.Google Scholar
4. Cheng, Y., Steams, M.B. and Smith, D.J. in Thin Film Structures and Phase Stability, edited by Clemens, B.M. and Johnson, W.L. (Mater. Res. Soc. Proc. 187, Pittsburgh, PA 1990) pp.151–156.Google Scholar
5. Fleet, S.G., Mullard Res. Rept. 466 (1963).Google Scholar
6. Chopra, K.L., Thin Film Phenomena. (McGraw-Hill, 1969) p.185.Google Scholar
7. Stearns, M.B., Phys. Rev. B 38, 8109 (1988).Google Scholar
8. Cullity, B.D., Elements of X-ray Diffraction, 2nd ed. (Addison-Wesley Publishing Company, Inc., 1978) p.506.Google Scholar
9. Kooy, C. and Nieuwenhuizen, J.M., Basic Problems in Thin Film Physics, edited by Niedermayer, R. and Mayer, H., (Vandenhoeck & Ruprecht, Gottingggen, 1966), p. 181.Google Scholar
10. Nieuwenhuizen, J.M. and Haanstra, H.B., Philips Techn. Rev., 27, 87 (1968).Google Scholar
11. Leamy, H.J. and Gilmer, G.H., Current Topics in Material Science, Vol.6, edited by Kaldis, E., (North-Holland Publishing Company, 1980), p.309.Google Scholar