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Molecular Dynamics Study of the Elastic Response of Crystalline, Amorphous and Chemically Disordered NiZr2

Published online by Cambridge University Press:  26 February 2011

Carlo Massobrio
Affiliation:
CNRS, Composés Non-Stoechiométriques, URA 446, Université de Paris Sud, 91407 Orsay Cedex, France
Vittorio Rosato
Affiliation:
ENEA-TIB C.R.E. CASACCIA, Divisione Scienza dei Materiali, Roma, Italy
Francois Willaime
Affiliation:
Centre d'Etudes Nucléaires de Saclay, Section de Recherches de Métallurgie Physique, 91191 Gif-Sur-Yvette Cedex, France
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Abstract

We calculate the shear elastic constants of the alloy NiZr2 by molecular dynamics simulations in the crystalline and amorphous phases as well as upon introduction of antisite defects in the crystal at T=300K. For S (long range order parameter) equal to 0.5, the system is amorphous and C' is larger than the same quantity relative to the crystal whereas C44 and C66 are smaller.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

1. Massobrio, C., Pontikis, V. and Martin, G., Phys. Rev. Lett. 62, 1142 (1989)Google Scholar
2. Rosato, V., Guillopé, M.6 and Legrand, B., Phil. Mag A59, 321 (1989)Google Scholar
3. Okamoto, P. R., Rehn, L.E., Pearson, J., Bhadra, R. and Grimsditch, M., J. Less Common Met. 140, 231 (1988)Google Scholar
4. Meng, W. J., Okamoto, P. R., Thompson, L. J., Kestel, B. J. and Rehn, L. E., Appl. Phys. Lett. 53, 1820 (1988)CrossRefGoogle Scholar
5. Okamoto, P. R. and Meshii, M., in Science of Advanced Materials, ASM publication 1990, edited by Wiedersich, H. and Meshii, M. (to be published)Google Scholar
6. Oh, D. J. and Johnson, R. A., J. Mater. Res. 3, 471 (1988)Google Scholar
7. Andersen, H. C., J.Chem.Phys. 22, 2384 (1980)Google Scholar
8. Ray, J. R., Comp. Phys. Reports, 8, 109 (1988)Google Scholar
9. Parrinello, M. and Rahman, A., J. Appl. Phys, 52, 7182 (1981)Google Scholar
10. Nose, S., J. Chem. Phys. 81, 511 (1984)CrossRefGoogle Scholar
11. Barron, T. H. K. and Klein, M. L., Proc. Phys. Soc. 85, 523 (1965)Google Scholar
12. Wolf, D., Okamoto, P. R., Yip, S., Lutsko, J. F. and Kluge, M., J. Mater. Res. 5, 286 (1990)CrossRefGoogle Scholar