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Modelling surface growth in IBAD with rate equations

Published online by Cambridge University Press:  17 March 2011

Jussi K. Sillanpáá
Affiliation:
Department of Applied Science, UC Davis, Davis, CA 95616, USA
Ismo T. Koponen
Affiliation:
Department of Physics, University of Helsinki, P.O.Box 9, SF-00014 University of Helsinki, Finland
Niels Grønbech-Jensen
Affiliation:
Department of Applied Science, UC Davis, Davis, CA 95616, USA
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Abstract

We develop a rate-equation model for surface growth in ion beam assisted deposition. In terms of the rate coefficients the model describes how island detachment and breakup, adatom diffusion and interlayer transitions of adatoms affect the growth. We identify parameter values corresponding to different modes of growth and discuss our results and ways to improve the model.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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