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Modelling of Nanoindentation of Compliant Layers on Stiffer Substrates using Finite Element Analysis

Published online by Cambridge University Press:  01 February 2011

Charles A Clifford  and
Martin P Seah
Charles A Clifford
Affiliation:
[email protected], National Physical Laboratory, Quality of Life Division, Hampton Road, Teddington, Middlesex, TW11 0LW, Teddington, N/A, United Kingdom
Martin P Seah
Affiliation:
[email protected], National Physical Laboratory, Teddington, TW11 0LW, United Kingdom
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Abstract

Nanoindentation using an Atomic Force Microscope (AFM) or a nanoindenter was modelled using Finite Element Analysis (FEA). Force versus indentation depth data were taken for a system consisting of a compliant layer on a stiffer substrate. It was found that the FEA results may be expressed analytically by a simple function that describes the reduced modulus value obtained with Oliver and Pharr's method for any moduli values, thickness of layer or radius of the indenter tip. Initial results obtained by varying the Poisson's ratio of the layer and substrate are also presented.

Keywords

scanning probe microscopy (SPM)coatingthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1025: Symposium B – Nanoscale Phenomena in Functional Materials by Scanning Probe Microscopy , 2007 , 1025-B08-07
Copyright
Copyright © Materials Research Society 2008

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References

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