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Modelling of Drift Mobility Experiments on a-Si:H
Published online by Cambridge University Press: 15 February 2011
Abstract
We present recent results of a study of the behavior of electronic carriers in a-Si:H, using the model of multiple trapping (MT) in an exponential density of states. In previous publications, using Monte Carlo simulations, we showed that the standard low field MT model gives reasonable agreement with experiment particularly if the Meyer-Neldel effect is included in the model. We report here on the results of including two other effects. First, we have included a simple model of field assisted detrapping, to take account of the effect of high fields. We obtain very good agreement with the results of measurements on both electrons and holes, from a number of laboratories. In addition, we show here that the validity of an effective temperature approach can be checked easily by comparison with experiment. Second, we have presented a simple model of rapid relaxation of trapped carriers. This model offers the possibility of removing the apparent inconsistency between these measurements, and other experiments.
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- Copyright © Materials Research Society 1999