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Modeling of Pyrolytic Laser-Assisted Chemical Vapor Deposition: Effects of Kinetics and Choice Of Substrate

Published online by Cambridge University Press:  26 February 2011

D.C. Skouby  and
K.F. Jensen
D.C. Skouby
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
K.F. Jensen
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
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Abstract

The pyrolytlc laser-assisted deposition of metals Is modeled. A finite element approach is used to solve for temperatures and gas-phase concentrations In a transient calculation. The model accommodates the use of temperature-dependent physical properties as well as the occurrence of irregularly shaped deposits. Volcano-like deposits’ are predicted under certain conditions of gas pressure and laser intensity. The effect of using substrates with different thermal conductivities is investigated. Using adsorption-desorption kinetics such that the reaction rates have sharp maxima with respect to temperature, volcanoes of varying depths are modeled.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 107
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1 Ehrlich, D.J. and Tsao, J.Y., J. Vac. Sci Tech. Bl, 969 (1983).Google Scholar
2 Rytz-Froidevaux, Y., Salathe, R.P., and Gilgen, H.H., Appl. Phys. A37, 121 (1985).Google Scholar
3 Allen, S.D., J. Appl. Phys. J52, 6501 (1981).Google Scholar
4 Moylan, C.R., Baum, T.H., and Jones, C.R., Appl. Phys. A40, 1 (1986).Google Scholar
5 Cllne, H.E. and Anthony, T.R., J. Appl. Phys. 48, 3895 (1977).Google Scholar
6 Lax, M., J. Appl. Phys. 48, 3919 (1977).Google Scholar
7 Lax, M., J. Appl. Phys. 33, 786 (1978).Google Scholar
8 Allen, S.D., Goldstone, J.A., Stone, J.P., and Jan, R.Y., J. Appl. Phys. 59, 1653 (1986).Google Scholar
9 Skouby, D.C. and Jensen, K.F., J. Appl. Phys. 63, 198 (1988).Google Scholar
10 Gresho, P.M., Lee, R.L. and Sani, R.L., In Recent Advances In Numerical Methods In Fluids (Plneridge Press, Swansea, U..K., 1981) Vol. 1, p. 27.Google Scholar
11 Carberry, J.J., Chemical and Catalytic Reaction Engineering (McGraw-Hill, New York, 1976).Google Scholar