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Modeling and Validation of Sensor and Actuator Dynamics for, And Real-Time Feedback Control of Thermal Chlorine Etching of Gallium Arsenide

Published online by Cambridge University Press:  10 February 2011

I. G. Rosen ,
T. Parent ,
R. Mancera ,
P. Chen  and
A. Madhukar
I. G. Rosen
Affiliation:
Center for the Intelligent Manufacturing of Semiconductors (CIMOS)University of Southern California, Los Angeles, CA 90089 USA
T. Parent
Affiliation:
Center for the Intelligent Manufacturing of Semiconductors (CIMOS)University of Southern California, Los Angeles, CA 90089 USA
R. Mancera
Affiliation:
Center for the Intelligent Manufacturing of Semiconductors (CIMOS)University of Southern California, Los Angeles, CA 90089 USA
P. Chen
Affiliation:
Center for the Intelligent Manufacturing of Semiconductors (CIMOS)University of Southern California, Los Angeles, CA 90089 USA
A. Madhukar
Affiliation:
Center for the Intelligent Manufacturing of Semiconductors (CIMOS)University of Southern California, Los Angeles, CA 90089 USA
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Abstract

A dynamic model for the simulation of thermal chlorine etching of gallium arsenide is developed. The primary motivation for the development of the model is the design and testing of real time feedback controllers which rely upon in-situ optical measurements of etch depth obtained via spectroscopic ellipsometry. Unmeasurable parameters which appear in the model are identified, and the model is validated using experimental data. A linear-quadratic controller based on our model is designed and tested.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 569: Symposium U – In Situ Process Diagnostics and Modelling , 1999 , 159
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

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