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Model Based Temperature Control in RTP Yielding ±0.1 °C accuracy on A 1000 °C, 2 second, 100 °C/s Spike Anneal
Published online by Cambridge University Press: 10 February 2011
Abstract
A Model Based Control method is presented for accurate control of RTP systems. The model uses 4 states: lamp filament temperature, wafer temperature, quartz temperature and TC temperature. A set of 4 first order, nonlinear differential equations describes the model. Feedback is achieved by updating the model, based on a comparison between actual (measured) system response and modeled system response.
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- Research Article
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- Copyright © Materials Research Society 1998
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