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Mist Deposition Technique as a Green Chemical Route for Synthesizing Oxide and Organic Thin Films

Published online by Cambridge University Press:  31 January 2011

Shizuo Fujita ,
Kentaro Kaneko ,
Yutaka Fukui ,
Hiroyuki Nishinaka ,
Takumi Ikenoue  and
Taichi Nomura
Shizuo Fujita
Affiliation:
[email protected], Kyoto University, Kyoto, Japan
Kentaro Kaneko
Affiliation:
[email protected], Kyoto University, Kyoto, Japan
Yutaka Fukui
Affiliation:
[email protected], Kyoto University, Kyoto, Japan
Hiroyuki Nishinaka
Affiliation:
[email protected], Kyoto University, Kyoto, Japan
Takumi Ikenoue
Affiliation:
[email protected], Kyoto University, Kyoto, Japan
Taichi Nomura
Affiliation:
[email protected], Kyoto University, Kyoto, Japan
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Abstract

Ultrasonic spray-assisted mist deposition techniques have been developed as a cost-effective and environmental friendly deposition method for oxide and organic thin films. The chemical vapor deposition (CVD) of a variety of oxide thin films having unique functions, such as Cr2O3, Cu2O, Fe3O4, and Al2O3 thin films, has been demonstrated as well as high-quality ZnO and Ga2O3 films ever reported. In addition to the films deposition by the CVD process, the deposition of organic material thin films from the source solution has also been achieved; as examples we have shown the patterned deposition of water-soluble fluorescent polymers with a metal mask. This may substitute the spin-coating technique and contribute to increase the source consumption efficiency in the thin film deposition. We appeal that the mist deposition is a unique and promising technique as a green chemical route for film deposition.

Keywords

chemical synthesisspray depositionthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1220: Symposium BB – Green Chemistry in Research and Development of Advanced Materials , 2009 , 1220-BB04-06
Copyright
Copyright © Materials Research Society 2010

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