Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-11-26T20:16:01.540Z Has data issue: false hasContentIssue false
  • English
  • Français

Microstructure Evolution of Epitaxial (Ba, Sr) TiO3/ (001) HgO Thin Films

Published online by Cambridge University Press:  15 February 2011

V.A. Alyoshin ,
E.V. Sviridov ,
V.I.M. Hukhortov ,
I.H. Zakharchenko  and
V.P. Dudkevich
V.A. Alyoshin
Affiliation:
Institute of Physics, Rostov State University, 194 Stachki ave., Rostov-on-Don, 344104 Russia
E.V. Sviridov
Affiliation:
Institute of Physics, Rostov State University, 194 Stachki ave., Rostov-on-Don, 344104 Russia
V.I.M. Hukhortov
Affiliation:
Institute of Physics, Rostov State University, 194 Stachki ave., Rostov-on-Don, 344104 Russia
I.H. Zakharchenko
Affiliation:
Institute of Physics, Rostov State University, 194 Stachki ave., Rostov-on-Don, 344104 Russia
V.P. Dudkevich
Affiliation:
Institute of Physics, Rostov State University, 194 Stachki ave., Rostov-on-Don, 344104 Russia
Get access

Abstract

Surface and cross-section relief evolution of ferroelectric epitaxial (Ba,Sr)TiO3 films rf-sputtered on (001) HgO crystal cle-avage surface versus the oxygen worKing gas pressure P and subst-rate temperature T were studied. Specific features of both three-dimensional and two-dimensional epitaxy mechanisms corresponding to various deposition conditions were revealed. Difference between low and high P-T-value 3D epitaxy was established. The deposition of films with mirror-smooth surfaces and perfect interfaces is shown to be possible.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 361: Symposium I2 – Ferroelectric Thin Films IV , 1994 , 501
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Surowiak, Z., Hikitin, Y., Biryukov, S., Golovko, Y., Hukhortov, V. and Dudkevich, V.. Thin Solid Films. 208, 76 (1992)Google Scholar