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Microstructure Characterization of Amorphous Silicon Based Alloys by Inert Gas Effusion Studies
Published online by Cambridge University Press: 17 March 2011
Abstract
It is shown that inert gas effusion employing implanted neon and argon atoms is a useful tool for microstructure characterization of a-Si based alloys. The method measures sensitively interconnected voids and gives information about sizes of microstructure. Limitations of the method are discussed. The results show network reconstruction effects in a-Si:O:H and a-Si:C:H alloys as a function of annealing.
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- Research Article
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- Copyright © Materials Research Society 2000
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