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Microstructure and Physical Properties of Ferroelectric-gate Memory Capacitors with Various Buffer Layers

Published online by Cambridge University Press:  21 March 2011

Christine Caragianis-Broadbridge
Affiliation:
Department of Physics, Southern Connecticut State Univ., New Haven, CT 06515
Jin-ping Han
Affiliation:
Department of Electrical Engineering, Yale Univ., New Haven, CT 06520
T. P. Ma
Affiliation:
Department of Electrical Engineering, Yale Univ., New Haven, CT 06520
Ann Hein Lehman
Affiliation:
Facility for Electron Microscopy; Trinity College, Hartford, CT 06106
Wenjuan Zhu
Affiliation:
Department of Electrical Engineering, Yale Univ., New Haven, CT 06520
Zhijiong Luo
Affiliation:
Department of Electrical Engineering, Yale Univ., New Haven, CT 06520
Daniel L. Pechkis
Affiliation:
Department of Physics, Southern Connecticut State Univ., New Haven, CT 06515
Bruce L. Laube
Affiliation:
United Technologies Research Center, East Hartford, CT 06108
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Abstract

This paper reports the microstructure and physical properties of ferroelectric capacitors formed from SrBi2Ta2O9(SBT) layers on Si with various buffer layers including jet-vapor deposited silicon nitride, zirconium oxide, hafnium oxide and thermally grown silicon oxide. Results from cross-sectional transmission electron microscopy (X-TEM), energy dispersive spectroscopy (EDS), X-Ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and non-contact atomic force microscopy (nc-AFM) data coupled with capacitance-voltage (C-V) and current- voltage (I-V) data indicate that both the microstructure and physical properties of SBT films deposited on silicon are dependent on the buffer layer material employed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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