Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-26T21:40:42.346Z Has data issue: false hasContentIssue false

Microstructure and optical properties of GaN films grown on porous SiC substrate by MBE

Published online by Cambridge University Press:  01 February 2011

F. Yun
Affiliation:
Virginia Commonwealth University, Dept. of Electrical Engineering, Richmond, VA23284
M. A. Reshchikov
Affiliation:
Virginia Commonwealth University, Dept. of Electrical Engineering, Richmond, VA23284
L. He
Affiliation:
Virginia Commonwealth University, Dept. of Electrical Engineering, Richmond, VA23284
T. King
Affiliation:
Virginia Commonwealth University, Dept. of Electrical Engineering, Richmond, VA23284
D. Huang
Affiliation:
Virginia Commonwealth University, Dept. of Electrical Engineering, Richmond, VA23284
H. Morkoç
Affiliation:
Virginia Commonwealth University, Dept. of Electrical Engineering, Richmond, VA23284
C. K. Inoki
Affiliation:
Univ at Albany, SUNY, Dept of Physics, Albany, NY 12222
T. S. Kuan
Affiliation:
Univ at Albany, SUNY, Dept of Physics, Albany, NY 12222
Get access

Abstract

GaN thin films were grown on porous SiC substrates using reactive molecular beam epitaxy with ammonia as the nitrogen source. Microstructure analysis and optical characterization were performed to assess the quality of the effect of pores on the growth and the quality of the GaN films. Results indicate that the GaN films on porous SiC are slightly less defective and more strain-relaxed (some completely relaxed) when grown on porous SiC substrate, as compared to growth on standard 6H-SiC substrates. Rocking curve FWHMs of 3.3 arcmin for (0002) diffraction and 13.7 arcmin for (1012) diffraction were obtained for sub-micron thick GaN films. Excitonic transition with FWHM as narrow as 9.5 meV was observed at 15K on the GaN layer grown on porous SiC without a skin layer.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Strite, S.T. and Morkoç, H., J. Vac. Sci & Technol., B10, 1237(1992)Google Scholar
2 Lin, M.E., Strite, S., Agarwal, A., Salvador, A., Zhou, G.L., Teraguchi, N., Rockett, A. and Morkoç, H., Appl. Phys. Letts. 62, 702(1993)Google Scholar
3 Morkoç, H., “Nitride Semiconductors and Devices”, Springer Verlag 1999. ISSN 0933-033x, ISBN 3-540-64038.Google Scholar
4 Morkoç, H., in “Wide Energy Bandgap Electronics” Eds. Pearton, S. and Ren, F., World Scientific, in press.Google Scholar
5 Chelnokov, V. E., Syrkin, A. L., and Dmitriev, V. A., Diamond Relat. Mater. 6, 1480(1997)Google Scholar
6 Ishihara, Y., Yamamoto, J., Kurimoto, M., Takano, T., Honda, T., Kawanishi, H., Jpn. J. Appl. Phys. 38, L1296 (1999).Google Scholar
7 Kusakabe, K., Kikuchi, A., and Kishino, K., J. Cryst. Growth, in press, 2002.Google Scholar
8 Spanier, J. E., Dunne, G. T., Rowland, L. B., and Herman, I. P., Appl. Phys. Lett. 76, 3879(2000)Google Scholar
9 Mynbaeva, M., Saddow, S. E., Melnychuk, G., Nikitina, I., Scheglov, M., Sitnikova, A., Kuznetsov, N., Mynbaev, K., and Dmitriev, V., Appl. Phys. Lett. 78, 117(2001)Google Scholar
10 Nikolaev, A., Melnik, Y., Blashenkv, M., Kuznetsov, N., Nikitina, I., Zubrilov, A., Tsvetkov, D., Nikolaev, V., Dmitriev, V., and Soloviev, V., MRS Internet J. Nitride Semicond. Res. 1, 45(1996)Google Scholar
11 Mynbaeva, M., Titkov, A., Kryganovskii, A., Ratnikov, V., Mynbaev, K., Huhtinen, H., Laiho, R., and Dmitriev, V., Appl. Phys. Lett. 76, 1113(2000)Google Scholar
12 Currently, we do not exclude the possibility of some fluctuations in growth temperatures which could strongly affect the available reactive N for growth due to the fact that NH3 cracking rate is exponentially dependent on temperature.Google Scholar