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Microstructural Studies of IAD and PVD Cr Coatings by Cross Section Transmission Electron Microscopy

Published online by Cambridge University Press:  28 February 2011

C. C. Cheng ,
R. A. Erck  and
G. R. Fenske
C. C. Cheng
Affiliation:
Materials and Components Technology Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
R. A. Erck
Affiliation:
Materials and Components Technology Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
G. R. Fenske
Affiliation:
Materials and Components Technology Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, IL 60439
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Abstract

Cross section transmission electron microscopy was used to study the microstructure and interface structure of Cr films deposited by ion-assisted deposition as a function of the incident ion energy. High-energy ion bombardment (1 keV) was found to enhance the adhesion of the deposited film owing to the formation of an intermixed layer, whereas deposition with lowenergy ions (100 eV) was found to reduce or eliminate grain boundary porosity. A tailored Cr film with excellent adhesion and no grain boundary porosity was deposited by combining highand low-energy ion bombardment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 140: Symposium S – New Materials Approaches to Tribology: Theory and Applications , 1988 , 177
Copyright
Copyright © Materials Research Society 1989

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