Hostname: page-component-78c5997874-g7gxr Total loading time: 0 Render date: 2024-11-06T05:18:16.516Z Has data issue: false hasContentIssue false
  • English
  • Français

Microfabricated Tem Sections

Published online by Cambridge University Press:  21 February 2011

H. W. Deckman
H. W. Deckman*
Affiliation:
Exxon Research and Engineering Co., Clinton Township, Annandale, New Jersey 08801
Get access

Abstract

A simple convenient technique is described for fabricating 25-5,000Å sized microstructures which are suitable for use as thin sections in transmission electron microscopy. Microstructures are produced by reactive ion beam etching (RIBE) a submonolayer colloidal particle mask, and several effects seen in RIBE are discussed. In particular, it is shown that polymeric deposits formed on vertical side walls can be imaged and etch rates near the surface of some materials can differ substantially from the bulk. The microfabrication technique affords a simple method to study the internal structure of thin deposited films and use of the technique is illustrated with structural studies of amorphous semiconductor superl atti ces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 215
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Broers, A. N., Harper, J. M. E. and Molzer, W. W., Appl. Phys. Lett. 33, 382 (1978).CrossRefGoogle Scholar
2. Howard, R. E., Liao, P. F., Skocpol, W. K., Jackel, L. D. and Craighead, H. G., Science 221, 117 (1983).CrossRefGoogle Scholar
3. Craighead, H. G., J.Appl. Phys. 55. 4430 (1984).CrossRefGoogle Scholar
4. Murray, A., Isaacson, M., Adesi-da, I. and Whitehead, B., J. Vac. Sci. Technol. B1, 1091 (1984).Google Scholar
5. Flanders, D. C., J. Vac. Sci. Technol. 16, 1615 (1979).CrossRefGoogle Scholar
6. Tsmita, N., Melngailis, J., HawrylTu-, A. M. and Smith, H. I., J. Vac. Sci. Technol. 19, 1211.CrossRefGoogle Scholar
7. Anderson, E. and Smith, H. I., 1983 International Symposium on Electron Ion and Photon Beams (unpublished).Google Scholar
8. Giordano, N., Gilson, W. and Prober, D. E., Phys. Rev. Lett. 43, 725 (1979).CrossRefGoogle Scholar
9. Deckman, H. W. and Dunsmuir, J., Appl. Phys. Lett. 41, 377 (1982).CrossRefGoogle Scholar
10. Deckman, H. W. and Dunsmuir, J., J. Vac. Sci. TechnoT. BI, 1109 (1983).Google Scholar
11. Lidbury, D. P. G., Pettit, H. R. and Booker, G. R., Electron Eng. 43, 50 (1971).Google Scholar
12. Petroff, P. M., Gossard, A. C., Wiegmann, W. and Savage, A., J. Cryst. Growth 44, 5 (1978).CrossRefGoogle Scholar
13. OkamoTo, H., Seki, M. and Korikoshi, Y., Jpn. J. Appl. Phys. Lett. 12, 367 (1983).CrossRefGoogle Scholar
14. Deckman, H. W., Dunsmuir, J. and Abeles, B., Appl. Phys. Lett., to be published.Google Scholar
15. Abeles, B. and Tiedje, T., Phys. Rev. Lett. 51, 203 (1983).CrossRefGoogle Scholar
16. Roxlo, C. B., Abeles, B. and Tiedje, T., Phys. rev. Lett. 52, 1994 (1984).CrossRefGoogle Scholar
17. Tiedje, T. and Abeles, B., Appl. Phys. Lett., 45, 179 (1984).CrossRefGoogle Scholar
18. Bradford, E. B. and Vanderhoff, J. W., J. Polymer Sci. C3, 41 (1960).Google Scholar
19. Stober, W. and Fink, A., J. Colloid Interface Sci. 26, 62 (1968).CrossRefGoogle Scholar
20. Rembaum, A. and Dreyer, W.J., Science 208, 25 (1980).CrossRefGoogle Scholar
21. Iler, R. K., J. Colloidal and Interface Science, 21, 569 (1966).CrossRefGoogle Scholar
22. Gains, G. L., Thin Solid Films 99, 273 (1983). -Google Scholar
23. Peiffer, D., Corley, T. J., MvUHalpern, G. and Brinker, B. A., Polymer 22, 450 (1981).CrossRefGoogle Scholar
24. Dozier, W. D. and Chaikin, P. M., J. Physique 43, 843 (1982).CrossRefGoogle Scholar