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Microdefects and Impurities in Dislocation-Free Silicon Crystals

Published online by Cambridge University Press:  15 February 2011

Takao Abe
Affiliation:
Shin-Etsu Handotai Co., 2–13–1, Isobe, Annaka-shi, Gunma-ken, 379–01, Japan
Hirofumi Harada
Affiliation:
Shin-Etsu Handotai Co., 2–13–1, Isobe, Annaka-shi, Gunma-ken, 379–01, Japan
Jun-Ichi Chikawa
Affiliation:
NHK Broadcasting Science Research Laboratories, Kinuta, Setagaya-ku, Tokyo, 157
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Abstract

Microdefects in striated (swirl defects) and nonstriated distribution (D-defects) have been observed in float-zoned crystals doped with various impurities by x-ray topography following copper decoration. A new type of defects were found to be present in swirl-free and D-defect-free regions and to become invisible by doping gallium. This gallium effect led to the conclusion that they are microprecipitates produced from residual oxygen impurity in FZ crystals. Effects of various impurities on defect formation indicate that D-defects are of vacancy agglomerates. It was observed that swirl defects are formed when the temperature gradient near the interface is high, and that their formation is suppressed by doping nitrogen. Formation processes of microprecipitates, swirls, and D-defects are discussed on the basis of observation of their mutual interaction and the impurity effects.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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