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Microcrystalline Si thin films by re-crystallization of electrophoretic deposited Si nanoparticle films

Published online by Cambridge University Press:  30 September 2014

Braden Bills ,
Mukul Dubey ,
Baojie Yan ,
David Stevenson  and
Qi Hua Fan
Braden Bills
Affiliation:
Applied NanoFilms, 2301 Research Park Way STE 217, Brookings, SD 57006, USA Electrical Engineering department, South Dakota State University, Brookings, SD 57006, USA
Mukul Dubey
Affiliation:
Electrical Engineering department, South Dakota State University, Brookings, SD 57006, USA
Baojie Yan
Affiliation:
Wintek Electro-Optical Corp., 1665 Highland Dr. STE E, Ann Arbor, MI 48108, USA
David Stevenson
Affiliation:
Wintek Electro-Optical Corp., 1665 Highland Dr. STE E, Ann Arbor, MI 48108, USA
Qi Hua Fan
Affiliation:
Applied NanoFilms, 2301 Research Park Way STE 217, Brookings, SD 57006, USA Electrical Engineering department, South Dakota State University, Brookings, SD 57006, USA
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Abstract

A new route to producing microcrystalline silicon (µc-Si) thin films by re-crystallizing Si nanoparticle films by flash lamp method is presented. High quality Si nanoparticle films with high uniformity and high particle packing density were obtained using a stable non-aqueous Si nanoparticle suspension and the electrophoretic deposition (EPD) method. Morphology and crystallinity of as-deposited and flash lamp re-crystallized Si nanoparticle films were studied.

Keywords

Sinanostructurethin film
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1694: Symposium EE – Advances in Inorganic Semiconductor Nanoparticles and Their Applications , 2014 , mrss14-1694-ee07-03
Copyright
Copyright © Materials Research Society 2014 

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References

REFERENCES

Wu, H. and Cui, Y., “Designing nanostructured Si anodes for high energy lithium ion batteris,” nanotoday, vol. 7, pp. 414–429, 2012.10.1016/j.nantod.2012.08.004CrossRefGoogle Scholar
Erogbogbo, F., Lin, T., Tucciarone, P. M., Lajoie, K. M., Lai, L., Patki, G. D., et al. ., “On-demand hydrogen generation using nanosilicon: splitting water without light, heat, or electricity,” Nano Lett., vol. 13, pp. 451–456, 2013.10.1021/nl304680wCrossRefGoogle ScholarPubMed
LumiSands.com .Google Scholar
Svrcek, V., Slaoui, A., and Muller, J. C., “Silicon nanocrystals as light converter for solar cells,” Thin Solid Films, vol. 451–452, pp. 384–388, 2004.10.1016/j.tsf.2003.10.133CrossRefGoogle Scholar
Haag, M., “Method for deposition of nanoparticles onto substrate and high energy density device fabrication,” 2011.Google Scholar
Shah, A., Thin film silicon solar cells. Boca Raton, Fl: CRC Press, 2010.10.1201/b16327CrossRefGoogle Scholar
Lueder, E., Liquid crystal display: John Wiley & Sons Ltd, 2001.Google Scholar
Palani, I. A., Vasa, N. J., Singaperumal, M., and Okada, T., “Investigation on laser-annealing and subsequent laser-nanotexturing of amorphous silicon (a-Si) films for photovoltaic application,” Journal of laser micro/nanoengineering, vol. 5, 2010.10.2961/jlmn.2010.02.0010CrossRefGoogle Scholar
Slama, S. B., Hajji, M., and Ezzaouia, H., “Crystallization of amorphous silicon thin films deposited by plasma enhanced chemical vapour deposition on nickel-metalized porous silicon ” Nanoscale Research Letters, vol. 7:464, 2012.10.1186/1556-276X-7-464CrossRefGoogle Scholar
Peng, Y. C., Fu, G. S., Yu, W., Li, S. Q., and Wang, Y. L., “Crystallization of amorphous Si films by pulsed laser annealing and their structural characteristics,” Semiconductor science and technology, vol. 19, p. 759, 2004.10.1088/0268-1242/19/6/018CrossRefGoogle Scholar
Winer, K., Anderson, G. B., Ready, S. E., Bachrach, R. Z., Johnson, R. I., Ponce, F. A., et al. ., “Eximer-laser-induced crystallization of hydrogenated amorphous silicon,” Appl. Phys. Lett., vol. 57, p. 2222, 1990.10.1063/1.103897CrossRefGoogle Scholar
Jakhanwal, V., “LG display tablet panel sales revenue climbs in Q2,” IHS iSuppli, 2012.Google Scholar
Pecz, B., Dobos, L., Panknin, D., Skorupa, W., Lioutas, C., and Vouroutzis, N., “Crystallization of amorphous-Si films by flash lamp annealing,” Applied Surface Science, vol. 242, pp. 185–191, 2005.10.1016/j.apsusc.2004.08.015CrossRefGoogle Scholar
Smith, M., McMahon, R., Voelskow, M., Panknin, D., and Skorupa, W., “Modelling of flashlamp induced crystallization of amorphous silicon thin films on glass,” Journal of Crystal Growth, vol. 285, pp. 249–260, 2005.10.1016/j.jcrysgro.2005.08.033CrossRefGoogle Scholar
Hossein-Babaei, F. and Raissi-Dehkordi, B., “Fabrication of poly-Si thick films by electrophoretic deposition,” Electron. Lett., vol. 37, pp. 1090–1092, 2001.10.1049/el:20010723CrossRefGoogle Scholar
Gardeshzadeh, A. R., Raissi, B., and Marzbanrad, E., “Preparation of Si powder thick films by low frequency alternating electrophoretic deposition,” J. Mater. Sci., vol. 43, pp. 2507–2508, 2008.10.1007/s10853-008-2519-zCrossRefGoogle Scholar
Ordung, M., Lehmann, J., and Ziegler, G., “Fabrication of fibre reinforced green bodies by electrophoretic deposition of silicon powder from aqueous suspensions,” J. Mater. Sci., vol. 39, pp. 889–894, 2004.10.1023/B:JMSC.0000012918.84125.39CrossRefGoogle Scholar