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Mechanical Properties of Sputter-Deposited Nb5Si3 Film and Nb5Si3/Nb Microlaminates

Published online by Cambridge University Press:  21 February 2011

S. P. Rawal ,
G. M. Swanson ,
W. C. Moshier  and
M. S. Misra
S. P. Rawal
Affiliation:
Martin Marietta Technologies, Inc., P.O. Box 179, MS-F3085, Denver, CO 80201
G. M. Swanson
Affiliation:
Martin Marietta Technologies, Inc., P.O. Box 179, MS-F3085, Denver, CO 80201
W. C. Moshier
Affiliation:
Martin Marietta Technologies, Inc., P.O. Box 179, MS-F3085, Denver, CO 80201
M. S. Misra
Affiliation:
Martin Marietta Technologies, Inc., P.O. Box 179, MS-F3085, Denver, CO 80201
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Abstract

Monolithic Nb5Si3 films and microlaminates consisting of alternating, equally thick layers of Nb and Nb5Si3 were synthesized by magnetron sputtering. Thick monolithic Nb5Si3 films (25,000 nm) were deposited on a sapphire substrate to set process parameters and evaluate the microstructure and mechanical properties of as-deposited crystalline films. Nb5Si3/Nb micro-laminates with modulation wavelengths (i.e., bilayer thickness) of 40 and 200 nm were deposited on Nb substrates. Mechanical properties (elastic modulus, microhardness, compressive yield strength) of the films and microlaminates were studied using the nanoindentation method and Vickers microhardness. Mechanical property test results are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 356: Symposium B2 – Thin Films: Stresses and Mechanical Properties V , 1994 , 397
Copyright
Copyright © Materials Research Society 1995

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