Hostname: page-component-745bb68f8f-cphqk Total loading time: 0 Render date: 2025-01-28T23:21:33.805Z Has data issue: false hasContentIssue false
  • English
  • Français

Measuring the Thin Film Strain Tensor Near Aluminum Grain Boundaries via a New Image Processing Approach to CBED HOLZ Patterns

Published online by Cambridge University Press:  10 February 2011

J. Inoue ,
A. F. Schwartzman  and
L. B. Freund
J. Inoue
Affiliation:
Department of Civil Engineering, University of Tokyo, Bunkyo, Tokyo 113-8656 [email protected]
A. F. Schwartzman
Affiliation:
Division of Engineering, Brown University, Providence, RI 02912
L. B. Freund
Affiliation:
Division of Engineering, Brown University, Providence, RI 02912
Get access

Abstract

HOLZ lines formed in a CBED pattern provide the most accurate means to measure a local strain tensor with high spatial resolution over mesoscopic length scales. With the advent of energy-filtering in a field-emission TEM, the precision of this measurement increases by filtering out the inelastically scattered electrons. This paper presents an alternate approach to obtaining the same increased precision by image processing of CBED patterns formed in a conventional LaB6 microscope. This technique results in the determination of the full strain tensor within ±0.01%. It is based on developing a Wiener filter for CBED patterns, deconvoluting the point spread function of the CCD camera, using the Hough transform to measure distances between HOLZ line intersections, and subtracting out an experimentally determined projector lens distortion. The present technique has been used to measure the strain tensor for the two types of grain boundaries found in MBE grown Al thin films on Si which have the mazed bicrystal microstructure.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 589 , 1999 , 51
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Lin, Y., Bird, D., and Vincent, R., Ultramicroscopy 27, 233 (1989).Google Scholar
[2] Zuo, J., Ultramicroscopy 41, 211 (1992).Google Scholar
[3] Streiffer, S., Bader, S., Deininger, C., and Mayer, M.R. J., in Polycrystalline Thin Films: Structure, Texture, Properties and Applications, Mater. Res. Soc. Symp. Proc. 343, edited by Barmuk, K. et al. (Materials Research Society, Pittsburgh, PA, 1994), pp. 615–620.Google Scholar
[4] Krämer, S. and Mayer, J., Journal of Microscopy 194, Pt 1, 2 (1999).Google Scholar
[5] Bird, D. and King, Q., Acta Crystallographica A46, 202 (1990).Google Scholar
[6] Shears, V. and Shelley, S., Acta Crystallographica A47, 441 (1991).Google Scholar