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Mass Spectrometric Analysis of a High Pressure, Inductively Coupled Plasma During Diamond Film Growth

Published online by Cambridge University Press:  22 February 2011

Peter G. Greuel ,
Hyun J. Yoon ,
Douglas W. Ernie  and
Jeffrey T. Roberts
Peter G. Greuel
Affiliation:
University of Minnesota, Department of Chemistry, 207 Pleasant St. SE, Minneapolis, MN 55455
Hyun J. Yoon
Affiliation:
University of Minnesota, Department of Electrical Engineering, 200 Union St. SE, Minneapolis, MN 55455
Douglas W. Ernie
Affiliation:
University of Minnesota, Department of Electrical Engineering, 200 Union St. SE, Minneapolis, MN 55455
Jeffrey T. Roberts*
Affiliation:
University of Minnesota, Department of Chemistry, 207 Pleasant St. SE, Minneapolis, MN 55455
*
Author to whom correspondence should be addressed
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Abstract

Determination of the gas phase composition at or near a substrate surface during plasma assisted chemical vapor deposition presents a challenging problem. The species located at a growing surface include highly reactive radicals which are difficult to detect in atmospheric plasma conditions. A system has been designed which consists of an inductively coupled rf plasma reactor linked to a quadrupole mass spectrometer (QMS) via a supersonic convergent-divergent nozzle. Differential pumping in the transient stages allows the plasma chamber to be operated at or near atmospheric pressures, while facilitating the detection of reactant species present in the growth boundary layer with the QMS.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 141
Copyright
Copyright © Materials Research Society 1994

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