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Magnetic Properties of Gadolinium Silicide Thin Films for Different Heat Treatments

Published online by Cambridge University Press:  15 February 2011

C. Pescher
Affiliation:
LETI, CEA, Technologies Avancées DOPT/CPM, 17g Avenue des Martyrs, 38054 Grenoble, cedex 9, France
J. Pierre
Affiliation:
CNRS, Laboratoire de Magnétisme Louis Néel, 25 avenue des Martyrs, BP166, 38042, Grenoble cedex 9, France
A. Ermolieff*
Affiliation:
LETI, CEA, Technologies Avancées DOPT/CPM, 17g Avenue des Martyrs, 38054 Grenoble, cedex 9, France
C. Vannuffel
Affiliation:
CNRS, Laboratoire de Magnétisme Louis Néel, 25 avenue des Martyrs, BP166, 38042, Grenoble cedex 9, France
*
corresponding author
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Abstract

The magnetic properties of heavy rare earth silicide GdSi2-x thin films are investigated as a function of the annealing temperature of the films. Resistivity measurements reveal in the two films annealed at high and low temperatures, but for a short time, the existence of two transition temperatures corresponding to the presence of an ordered and a disordered structure. In the film annealed at high temperature for a long time, only one transition temperature occurs. It corresponds to a magnetic structure transformation.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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