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Low-Temperature CVD Carbon Coatings on Glass Plates for Flat Panel Display Applications

Published online by Cambridge University Press:  14 March 2011

Yonhua Tzeng ,
Chao Liu ,
Calvin Cutshaw  and
Zheng Chen
Yonhua Tzeng
Affiliation:
Alabama Microelectronics Science and Technology Center, Department of Electrical and Computer Engineering, Auburn University, AL 36849
Chao Liu
Affiliation:
Alabama Microelectronics Science and Technology Center, Department of Electrical and Computer Engineering, Auburn University, AL 36849
Calvin Cutshaw
Affiliation:
Alabama Microelectronics Science and Technology Center, Department of Electrical and Computer Engineering, Auburn University, AL 36849
Zheng Chen
Affiliation:
Space Power Institute, Auburn University, AL 36849
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Abstract

Low-temperature chemical vapor deposition processes were studied for coating carbon films on metal-coated glass plates. Thermal CVD in hydrocarbon mixtures was used for carbon deposition at temperatures between 300°C and 550°C. Carbon deposited on metal coated glass plates were examined by SEM and analyzed using a pin to disk setup in an ultra high vacuum chamber for measuring the electron emission characteristics. Using a one-millimeter diameter tungsten rod with a hemispherical tip as the anode while the carbon coatings as the cathode, current-voltage characteristics of the carbon coatings were measured and used for calculating the electric field at which electron emission started as well as calculating the field enhancement factor of the carbon coatings. Field emission of electrons from carbon coatings starting from an electric field as low as 1.4 volts per micrometer has been achieved.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 621: Symposia Q/R – Electron-Emissive Materials, Vacuum Microelectronics… , 2000 , Q2.2.1
Copyright
Copyright © Materials Research Society 2000

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References

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