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Low-Dielectric Constant Film Formation By Plasma Fluorination Of Hydrocarbon Polymers

Published online by Cambridge University Press:  15 February 2011

Hiroshi Kudo ,
Rika Shinohara  and
Masao Yamada
Hiroshi Kudo
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Rika Shinohara
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
Masao Yamada
Affiliation:
Fujitsu LTD, Thin Film Technology Dept., Process Dev. Div. 1015Kamikodanaka, Nakahara-ku, Kawasaki 211, Japan
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Abstract

We have investigated plasma fluorination of hydrocarbon polymer films spincoated onto silicon wafers. Fluorinated hydrocarbon polymers gave low dielectric constants of 2.0 – 2.4 which was close to that of PTFE. However, the thermal stability of these fluorinated polymers inferior to that of the non-fluorinated polymers. We believe that this is due to a decrease in the molecular weight resulting from C-C bond cleavage. We think that such a side reaction will be controlled by removing residual oxygen in a fluorination chamber. The molecular structures of the fluorinated polymers were analyzed by X-ray photo emission spectroscopy. Finally, we proposed direct patterning of interlayer dielectrics using plasma fluorination.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 381: Symposium F – Low-Dielectric Constant Materials--Synthesis and Applications in Micro. , 1995 , 105
Copyright
Copyright © Materials Research Society 1995

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References

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