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Low Temperature Growth Mechanism of GaN Crystal by Hydride Vapor Phase Epitaxy

Published online by Cambridge University Press:  01 February 2011

Hai-Ping Liu
Affiliation:
Department of Material Science and Engineering, National Cheng-Kung University, Tainan, Taiwan, ROC
In-Gann Chen*
Affiliation:
Department of Material Science and Engineering, National Cheng-Kung University, Tainan, Taiwan, ROC
Jenq-Dar Tsay
Affiliation:
Opto-Electronics & System Laboratories, Industrial Technology Research Institute, Hsinchu, Taiwan, ROC
Wen-Yueh Liu
Affiliation:
Opto-Electronics & System Laboratories, Industrial Technology Research Institute, Hsinchu, Taiwan, ROC
Yih-Der Guo
Affiliation:
Opto-Electronics & System Laboratories, Industrial Technology Research Institute, Hsinchu, Taiwan, ROC
Jung Tsung Hsu
Affiliation:
Opto-Electronics & System Laboratories, Industrial Technology Research Institute, Hsinchu, Taiwan, ROC
*
*Corresponding author
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Abstract

The low temperature growth of GaN crystal using epitaxy lateral overgrowth (ELO) on SiO2 dot pattern below 900°C by hydride vapor phase epitaxy (HVPE) have been studied. It is observed that the growth rate of GaN hexagonal pyramidal crystals along [1101] direction increases as growth temperature decreases. At low temperature of ∼ 850°C, hexagonal GaN columnar crystals with high index facet at the top can be observed. It is proposed that the surface diffusion length of precursors, such as NH3 and GaCl, decreases at lower temperature that reduces the probability of desorption and increase the lifetime. The condensation of Ga liquid droplets on the GaN surface will change the relative stability of {1101} facet. Therefore, the formation of high index planes such as {2122} facet on the top of hexagonal column along with the formation of stacking fault on the (0001) plane can be observed. A detailed study of the effect of growth temperature on the crystal growth mechanism will be presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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